Search Result "chemical vapor deposition (CVD)"

Recent Advances in Chemical Vapor Deposition

Journal: Current Organic Chemistry
Volume: 10 Issue: 9 Year: 2006 Page: 1021-1033
Author(s): Bradley D. Fahlman

An Overview of Selected Catalytic Chemical Vapor Deposition Parameter for Aligned Carbon Nanotube Growth

Journal: Nanoscience & Nanotechnology-Asia
Volume: 4 Issue: 1 Year: 2014 Page: 2-30
Author(s): Mohd. Shahril Amin Bistamam,Mohd. Asyadi Azam,Nor Syafira Abdul Manaf,Pei Sean Goh,Mohd. Warikh Abdul Rashid,Ahmad Fauzi Ismail

HW-CVD Deposited Nanocrystalline Silicon Thin Films at Low Substrate Temperature with White-Blue Luminescence

Journal: Current Nanoscience
Volume: 11 Issue: 5 Year: 2015 Page: 621-626
Author(s): A. Dutt,S. Godavarthi,Y. Matsumoto,G. Santana-Rodriguez,A. Avila,V. Sanchez,G. Raina

Review Article

A Recent Patent on Microwave Plasma Chemical Vapor-Deposited Diamond Film on Cutting Tools

Journal: Recent Patents on Mechanical Engineering
Volume: 10 Issue: 2 Year: 2017 Page: 140-143
Author(s): Zhang Ling,Kong Dejun

CFD Simulation of Chemical Vapor Deposition of Silicon Carbide in CH3SiCl3-H2 System

Journal: Current Nanoscience
Volume: 10 Issue: 1 Year: 2014 Page: 135-137
Author(s): Kyoon Choi,Jun-Woo Kim

Taguchi Method Optimization of Parameters for Growth of Nano Dimensional SiC Wires by Chemical Vapor Deposition Technique

Journal: Current Nanoscience
Volume: 8 Issue: 1 Year: 2012 Page: 161-169
Author(s): Jyoti Prakash, Sunil K. Ghosh, D. Sathiyamoorthy, R. Venugopalan, B. Paul

Research Article

Strong Quantum Confinement Effects in Nanometer Devices with Graphene Directly Grown on Insulator by Catalyst-free Chemical Vapor Deposition

Journal: Current Graphene Science (Discontinued)
Volume: 1 Issue: 1 Year: 2017 Page: 44-48
Author(s): Hiroto Sato,Atsushi Nakamura,Amit Banerjee,Kenji Yamada,Hiroaki Satoh,Jiro Temmyo,Hiroshi Inokawa

Liquid and Solid Precursor Delivery Systems in Gas Phase Processes

Journal: Recent Patents on Materials Science
Volume: 8 Issue: 2 Year: 2015 Page: 91-108
Author(s): Constantin Vahlas,Brigitte Caussat,Wayne L. Gladfelter,François Senocq,Elizabeth J. Gladfelter

Research Article

Role of Deposition Pressure on Properties of Phosphorus Doped Hydrogenated Nano-Crystalline Silicon (nc-Si:H) Thin Films Prepared by the Cat-CVD Method

Journal: Recent Innovations in Chemical Engineering
Volume: 14 Issue: 1 Year: 2021 Page: 46-57
Author(s): Bharat Gabhale,Ashish Waghmare,Subhash Pandharkar,Ajinkya Bhorde,Shruthi Nair,Priti Vairale,Vidya Doiphode,Pratibha Shinde,Ashvini Punde,Yogesh Hase,Nilesh Patil,Mohit Prasad,Sandesh Jadkar

Review Article

Critical Atomic-level Processing Technologies: Remote Plasma-enhanced Atomic Layer Deposition and Atomic Layer Etching

Journal: Micro and Nanosystems
Volume: 10 Issue: 2 Year: 2018 Page: 75-82
Author(s): Guangjie Yuan,Haohao Li,Bo Shan,Johan Liu

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