Solid State & Microelectronics Technology


Author(s): Sunipa Roy*, Chandan Kumar Ghosh*, Sayan Dey* and Abhijit Kumar Pal * .

Pp: 302-321 (20)

DOI: 10.2174/9789815079876123010009

* (Excluding Mailing and Handling)


This chapter introduces the readers to the oxidation process focusing on silicon. It establishes the importance of oxidation in a silicon process and discusses the thermal oxidation process and its growth mechanism in depth. Towards the end, a detailed discussion on the oxide film characterization and its properties is provided. After reading this chapter, the readers are expected to have a sound knowledge of the oxidation process as a whole and its significance in the silicon processing industry.

Keywords: Oxidation, Silicon dioxide, Deal-Grove Model, Kinetics, Thin film oxides, Oxide-induced defects.

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