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Many nanofabrication techniques were reported in books and journals at present. In this chapter, we targeted two
commonly used approaches for fabrication of subwavelength metallic structures: focused ion beam (FIB) technology and laser
interference photolithography. The former can realized fine nanofabrication over a local tiny area in one-step only. But it is a
technique with high expenditure and small localized fabrication area. The latter can realize large area fabrication and cost effective.
But it needs pattern transformation from photoresist into substrate. Some fabrication examples were presented. Problems existing in
the fabrication processes were addressed as well.
School of Physical Electronics University of Electronic Science and Technology of China.