Atomic Localization and its application in atom nano-lithograph
Pp. 38-66 (29)
Luling Jin, Yueping Niu, Hui Sun, Shiqi Jin and Shangqing Gong
In this chapter, we give a brief review of our recent research work related to atomic
localization via the effects of atomic coherence and quantum interferences, as well as its application in
atom nano-lithograph, which includes atomic localization based on double-dark resonance effects,
sub-half-wavelength localization via two standing-wave fields and an atom nano-lithograph scheme via
two orthogonal standing-wave fields, etc..
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences.