Title:Nanoimprint Lithography - the Past, the Present and the Future
VOLUME: 12 ISSUE: 6
Author(s):Dongxu Wu, Nitul S. Rajput and Xichun Luo
Affiliation:Centre for Precision Manufacturing, Department of Design, Manufacture and Engineering Management, University of Strathclyde, 75 Montrose Street, Glasgow G1 1XJ, UK.
Keywords:Nanofabrication, nanoimprint lithography, resolution, roll-to-roll, throughput.
Abstract:Background: Nanoimprinting lithography technique uses a very simple
concept of transferring pattern of nanoscale features from a mold to a target substrate.
In the past two decades, this technique has successfully broken through the
barrier of laboratory scale production and become an industrial scale production
technique. The aim of this paper is to introduce to readers to the basic working
principle, applications, analysis the technological limitations. It will also point out
future research direction of this useful nanofabrication technique.
Methods: We adopted a systematic approach to give a comprehensive review of
the work principle, hardware and analysis of advantaged and disadvantages of
major nanoimprint lithography techniques. Moreover, a technical comparison of
these methods is carried out to provide future research direction.
Results: 87 papers were reviewed. Four techniques including thermal NIL, ultraviolet light NIL,
laser-assisted direct imprint and nanoelectrode lithography have been identified as main stream of
NIL techniques. These techniques possess certain advantages and disadvantages in terms of cost,
throughput, attainable resolution. Lack of flexibility is the common limitation of current NIL techniques.
NIL has gained wide applications in the fabrication of optoelectronics devices, solar cells,
memory devices, nanoscale cells, hydrophobic surfaces and bio-sensors. The potential applications
of NIL in biochips, artificial organs, diagnostic system, and fundamental research in cell biology will
demand large scale 3D fabrication capability with resolution towards 10nm or less.
Conclusions: The findings of this review confirm that NIL is one of the most employed commercial
platforms for nanofabrication which offers high throughput and cost-effectiveness. One of the disadvantages
of NIL over other nanofabrication techniques is the flexibility of patterning. Integrating
NIL with other existing nanofabrication techniques can be helpful to overcome such issue. The potential
applications of NIL in biochips, artificial organs, diagnostic system, and fundamental research
in cell biology will attract researchers to push nanoimprint lithography forward at a resolution of 10
nm or less in the future.
