Physics of Ion Implantation
Pp. 8-91 (84)
The interactions between incident ion and substrate atoms are classical
physical subjects. Ions lose its initial accelerated energy through the interaction between
electron cloud and nuclei. The process is described with fundamental atomic properties
such as atomic number and mass. Therefore, the model accommodates any combination
of incident atom as well as the substrate composed of various kinds of atoms. We show
the detail derivation process of nuclei and electronic stopping power models.
Ion implantation, nuclear stopping power, electronic stopping power,
two-body collision, laboratory system, center of mass system, elastic collision, Bohr
speed, Bethe model, Firsov, Lindhard model, Thomas-Fermi potential, Poisson
equation, Coulomb potential, channeling, damage, amorphous layer.
Fujitsu limited Minatoku kaigan 1-11-1 Tokyo Japan.