Sputtering of Thin Films
Pp. 58-80 (23)
Paolo Rava
Abstract
Sputtering is one of the most widely used techniques for deposition of thin films. This
chapter reviews the physical foundations of sputtering in a plasma and its application to the
deposition of thin films. Different sputtering techniques are described and their advantages and
disadvantages are highlighted.
Keywords:
Sputtering, plasma, glow discharge, thin films, magnetron cathode, ion beam,
deposition, targets, ionization, gases
Affiliation:
Elettrorava SpA, Via Don Sapino 176, 10078 Venaria, Torino, Italy