Deposition of Ni/TiN Composite Coatings by a Plasma Assisted MOCVD Using an Organometallic Precursor

Author(s): S. Arockiasamy, T. Maiyalagan, P. Kuppusami, C. Mallika, K.S. Nagaraja

Journal Name: Micro and Nanosystems

Volume 4 , Issue 3 , 2012

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Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis(5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films.

Keywords: Chemical vapour deposition, nano-composite, nickel, titanium nitride, metallic Ti, thin films, vapour pressure, corrosion, MOCVD, Ti complex, electrostatic effects, PAOMCVD, N2 plasma, free radicals, CVD chamber

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Article Details

Year: 2012
Page: [199 - 207]
Pages: 9
DOI: 10.2174/1876402911204030199
Price: $25

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