Abstract
To cope with the printability of smaller transistor and interconnect features in semiconductor integrated circuit manufacturing, the area of lithography has seen significant advancements over the last decade. In this chapter, we briefly go over these advancements while giving more weight on recent advancements and methods or those that have prevailed over the time. As particular examples for the recent developments, we review the area of double patterning lithography.
Related Journals
Recent Patents on Space Technology
Recent Progress in Space Technology (Discontinued)
Recent Patents on Engineering
Recent Patents on Mechanical Engineering
Current Alternative Energy
Recent Patents on Electrical Engineering
Recent Patents on Electrical & Electronic Engineering
Recent Advances in Electrical & Electronic Engineering
Related Books
6G Wireless Communications and Mobile Networking
Recent Advances in Renewable Energy
Recent Advances in Renewable Energy
Recent Advances in Renewable Energy
Recent Advances in Renewable Energy
Recent Advances in Renewable Energy
Solar Thermal Systems: Thermal Analysis and its Application
Recent Developments in Artificial Intelligence and Communication Technologies
40 YEARS OF SHS: A LUCKY STAR OF A SCIENTIFIC DISCOVERY A Presentation with Elements of a Scientific Lecture
A Review: Chill-Block Melt Spin Technique, Theories & Applications