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Recent Patents on Materials Science

Editor-in-Chief

ISSN (Print): 1874-4648
ISSN (Online): 1874-4656

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Author(s): Hailin Wang, Yihua Sun, Jian Chen, Liang Fang, Lei Wang, Linlong Ye and Wei Li

Volume 8 , Issue 3 , 2015

Page: [260 - 264] Pages: 5

DOI: 10.2174/1874464808666151014213229

Price: $65

Abstract

Transparent conductive aluminum-doped zinc oxide (AZO) films had been prepared on glass substrates by radio frequency magnetron sputtering with different sputtering powers using an ultra- high density ceramic target at 100°C Crystallinity levels, microstructures, optical and electrical properties of these thin films were systematically investigated by the scanning electron microscope, X-ray diffraction diffractometer, UV-visible spectrophotometer and four-point probe method. All the AZO thin films exhibited preferential orientation along the (0 0 2) plane with hexagonal wurtzite structure. The average transmittance of the thin films is over 86%, the highest transmittance 88.97% and the lowest resistivity 3x10-4Ω·cm are simultaneously obtained at 200W. With the sputtering power increase, the grain growth was deteriorated and the resistivity increased from 3x10-4Ω·cm to 2.5x10- 3Ω·cm. The band gaps of AZO films range from 3.81eV to 3.89eV. This article discussed some important patents related to the methods of depositing AZO thin films.

Keywords: AZO thin films, electrical properties, low temperature, magnetron sputtering, microstructure, optical properties.


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