Synchrotron X-ray Micro/Nanodiffraction Methods
Pp. 112-125 (14)
Terence K.S. Wong
Several X-ray diffraction methods using synchrotron sources are discussed in this chapter. For
epitaxial semiconductor samples, high resolution double axis and reciprocal space mapping methods are
applicable and measurement time can be reduced by the use of synchrotron radiation. The lattice strain can
be deduced directly from the measured inter-planar spacing using Bragg’s law without modeling.
Polycrystalline samples such as metal films are measured by the sin2Ψand sin2Ψmethods. Interconnects
with widths of the order of one micron can be mapped at this spatial resolution by a scanning X-ray
microdiffraction technique. This method does not involve sample rotation by a goniometer. The strain tensor
is deduced from an analysis of the von Laue diffraction image and comparison with a structural model of the
sample. A high flux density polychromatic X-ray beam is essential for this method.
Electron backscattering, Photovoltaics, Lithium ion battery, Resolution, Throughput.
Division of Microelectronics School of Electrical and Electronic Engineering Nanyang Technological University