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Micro and Nanosystems
ISSN (Print): 1876-4029
ISSN (Online): 1876-4037
VOLUME: 4
ISSUE: 2
DOI: 10.2174/1876402911204020123      Price:  $58









Research on Layout Optimization of Obstacles in a Passive Micromixer

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Author(s): Xueye Chen, Chong Liu and Zheng Xu
Pages 123-127 (5)
Abstract:
The paper focuses on optimizing layout of obstacles for enhanced mixing in microchannels. The obstacles can hinder fluid flow and alter the flow direction. In this case, the mixing performance can be achieved further effectively. Three parameters including geometric configuration, layout, and number of obstacles have been studied for analyzing mixing in a ‘T’ channel. In order to facilitate the design, numerical simulations and orthogonal experiment were used to study the effect of three parameters on sensitivity of mixing. The degree of sensitivity using the Taguchi method can be ranked as: asymmetric layout > number of obstacles > geometric configuration. Placing obstacles in the microchannels is an effective method for enhancing mixing and the micromixer with obstacles is relatively easy to produce using standard microfabrication techniques. It can be demonstrated that the results should facilitate the design of microfluidic device.
Keywords:
Microfluidic, micromixer, optimization layout, simulation
Affiliation:
Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116085, China