Abstract
Nanostructured mesoporous silica thin film has been deposited on silicon substrate by the spin-coating technique using CTAB as a template under acidic conditions. TGA, SEM, HRTEM, N2 adsorption-desorption isotherm, FTIR and synchrotron high flux beamline were used to characterize the microstructure and photoluminescence properties of the resulting film. After being calcined at 400 °C for 12 h, the thin film exhibited a very smooth surface and interconnected pores, with a pore size of about 1-2 nm. The synchrotron photoluminescence spectra show that the samples after calcination have three obvious luminescence peaks around 322, 387 and 410 nm arising from nonbridging oxygen hole centers (NBOHCs) and Si-OH surface complexes. The UV emission (322 nm) due to NBOHCs is inhibited by H2 plasma treatment, indicating that the nonbridging oxygen was saturated by the hydrogen atoms.
Keywords: Mesoporous silica, UV light, photoluminescence, spin-coating technique, hydrogen atoms, nonbridging oxygen, H2 plasma treatment, synchrotron radiation
Current Nanoscience
Title: Eliminated UV Light Emitted from Nanostructured Silica Thin Film using H2 Plasma by ICP-CVD
Volume: 7 Issue: 2
Author(s): Ding-Liang Chiang, Min-Hsiung Hon, Lay Gaik Teoh, Jiann Shieh, Bing-Ming Cheng, Hsiao-Chi Lu and Hsu-Chun Cheng
Affiliation:
Keywords: Mesoporous silica, UV light, photoluminescence, spin-coating technique, hydrogen atoms, nonbridging oxygen, H2 plasma treatment, synchrotron radiation
Abstract: Nanostructured mesoporous silica thin film has been deposited on silicon substrate by the spin-coating technique using CTAB as a template under acidic conditions. TGA, SEM, HRTEM, N2 adsorption-desorption isotherm, FTIR and synchrotron high flux beamline were used to characterize the microstructure and photoluminescence properties of the resulting film. After being calcined at 400 °C for 12 h, the thin film exhibited a very smooth surface and interconnected pores, with a pore size of about 1-2 nm. The synchrotron photoluminescence spectra show that the samples after calcination have three obvious luminescence peaks around 322, 387 and 410 nm arising from nonbridging oxygen hole centers (NBOHCs) and Si-OH surface complexes. The UV emission (322 nm) due to NBOHCs is inhibited by H2 plasma treatment, indicating that the nonbridging oxygen was saturated by the hydrogen atoms.
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Cite this article as:
Chiang Ding-Liang, Hon Min-Hsiung, Gaik Teoh Lay, Shieh Jiann, Cheng Bing-Ming, Lu Hsiao-Chi and Cheng Hsu-Chun, Eliminated UV Light Emitted from Nanostructured Silica Thin Film using H2 Plasma by ICP-CVD, Current Nanoscience 2011; 7 (2) . https://dx.doi.org/10.2174/157341311794653569
DOI https://dx.doi.org/10.2174/157341311794653569 |
Print ISSN 1573-4137 |
Publisher Name Bentham Science Publisher |
Online ISSN 1875-6786 |
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