Eliminated UV Light Emitted from Nanostructured Silica Thin Film using H2 Plasma by ICP-CVD

Author(s): Ding-Liang Chiang, Min-Hsiung Hon, Lay Gaik Teoh, Jiann Shieh, Bing-Ming Cheng, Hsiao-Chi Lu, Hsu-Chun Cheng.

Journal Name: Current Nanoscience

Volume 7 , Issue 2 , 2011

Become EABM
Become Reviewer


Nanostructured mesoporous silica thin film has been deposited on silicon substrate by the spin-coating technique using CTAB as a template under acidic conditions. TGA, SEM, HRTEM, N2 adsorption-desorption isotherm, FTIR and synchrotron high flux beamline were used to characterize the microstructure and photoluminescence properties of the resulting film. After being calcined at 400 °C for 12 h, the thin film exhibited a very smooth surface and interconnected pores, with a pore size of about 1-2 nm. The synchrotron photoluminescence spectra show that the samples after calcination have three obvious luminescence peaks around 322, 387 and 410 nm arising from nonbridging oxygen hole centers (NBOHCs) and Si-OH surface complexes. The UV emission (322 nm) due to NBOHCs is inhibited by H2 plasma treatment, indicating that the nonbridging oxygen was saturated by the hydrogen atoms.

Keywords: Mesoporous silica, UV light, photoluminescence, spin-coating technique, hydrogen atoms, nonbridging oxygen, H2 plasma treatment, synchrotron radiation

Rights & PermissionsPrintExport Cite as

Article Details

Year: 2011
Page: [240 - 244]
Pages: 5
DOI: 10.2174/157341311794653569
Price: $58

Article Metrics

PDF: 1