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Nanomechanical Response of Indented Multilayered Nanofilms with Size Effect

Author(s): Tong Hong Wang, Te-Hua Fang, Shao-Hui Kang.

Abstract:

Nanomechanical response of indented aluminum/titanium (Al/Ti) multilayered films were characterized using an Auger electron spectrometer, focused ion beam (FIB) machining, and transmission electron microscopy (TEM). The pure and multilayered films on Si(100) substrates were prepared using the radio frequency magnetron sputtering process. The empirical Hall-Petch relationship and its reverse effect on nanoindentation load-displacement curves, hardness, and Youngs moduli were discovered in individual layers at thicknesses of 28, 14, and 7 nm, respectively. The contributions of atomic sliding grain boundaries and their Al/Ti interfaces were studied. The Hall-Petch effect was seen in thickness of about 3.5 nm for its well blending at such nanometer scale.

Keywords: Multilayer, Hardness, Hall-Petch effect, Size effect, Nanoindentation

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Article Details

VOLUME: 6
ISSUE: 2
Year: 2010
Page: [173 - 177]
Pages: 5
DOI: 10.2174/157341310790945641
Price: $58