The ferroelectric thin film was widely investigated in detail in recent years. The ferroelectric properties of the thin films are obviously dependent on the microstructure and orientation of the film, which were influenced mainly by some processing parameters for preparing the films, including precursor solution chemistry, nature of substrate, film thickness, and condition of heat treatment etc. In this paper, these processing dependences for preparing of the films were reviewed.
Keywords: Thin film, ferroelectricity, processing effect, microstructure, orientation, polarization, coercive field
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