Background and Method: The growth mechanism of sulphide films formed on copper in
anaerobic 0.1 M NaCl + 5 x 10-4 M Na2S solution has been investigated under natural corrosion conditions
for exposure periods up to 1691 hours using scanning electron microscopy, focused ion beam
cross-sectioning, and a Au marker procedure.
Results and Conclusions: The film formed by a chemical deposition process via an outward growth
mechanism. This process was controlled by cuprous ion transport in the film combined with sulphide
diffusion in solution.
Keywords: Sulphide film, copper, corrosion, diffusion, crystal growth, microscopy.
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