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Anodic Metal Oxides for Electrowetting Systems

Author(s): M. Mibus, X. Hu, C. Knospe, M.L. Reed, G. Zangari.

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Abstract:

We discuss the electrochemical formation of metal oxide films as candidate materials for the primary dielectric layer in electrowetting-on-dielectric (EWOD) systems. The ability to produce significant contact angle reduction at low voltage requires thin (<100nm), high dielectric strength films that also exhibit a high breakdown field; these requirements are met in a wide variety of metal oxides. A detailed understanding of materials as well as electronic and ionic transport in dielectrics are essential for the development and performance enhancement of these devices; we describe the process of oxides in film formation, the peculiar defect structure, electrical transport processes, as well as degradation and breakdown. Additionally, examples of low-voltage EWOD systems based on oxide/hydrophobic bilayers are discussed along with current efforts to improve performance of the metal oxide layers.

Keywords: Anodization, dielectric breakdown, dielectric conduction, electrowetting, metal oxides.

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Article Details

VOLUME: 11
ISSUE: 3
Year: 2015
Page: [333 - 342]
Pages: 10
DOI: 10.2174/1573413711666150213000518
Price: $58