Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications

Editor(s): Filipe Vaz, Nicolas Martin and Martin Fenker

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Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better ...
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About the Editors  promotion: free to download

Pp. i-iii (3)

Filipe Vaz, Nicolas Martin and Martin Fenker



Foreword  promotion: free to download

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Allan Matthews



Preface  promotion: free to download

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Filipe Vaz, Nicolas Martin and Martin Fenker



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Modelling of Reactive Sputter Deposition of Oxynitrides

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Sören Berg, Tomas Nyberg and Diederik Depla


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Reactive Gas Pulsing Process for Oxynitride Thin Films

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Nicolas Martin, Jan Lintymer, Aurélien Besnard and Fabrice Sthal


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Tuneable Properties of Zirconium Oxynitride Thin Films

Pp. 64-112 (49)

Pedro Carvalho, Luis Cunha, Nuno Pessoa Barradas, Eduardo Alves, Juan Pedro Espinós and Filipe Vaz


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Gradual Evolution of the Properties in Titanium Oxynitride Thin Films

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Jean-Marie Chappé and Nicolas Martin


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Tuneable Properties of Aluminium Oxynitride Thin Films

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Joel Borges, Nuno P. Barradas, Eduardo Alves, Nicolas Martin, Marie-France Beaufort, Sophie Camelio, Dominique Eyidi, Thierry Girardeau, Fabien Paumier, Jean-Paul Rivière, Filipe Vaz and Luis Marques


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HfSiON Films Deposited by Radio Frequency Reactive Sputtering

Pp. 230-253 (24)

Li-Ping Feng and Zheng-Tang Liu


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Application of Oxynitrides for Microelectronic Devices and Gas Barriers

Pp. 285-339 (55)

Yung-Hsien Wu and Jia-Hong Huang


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Author Index  promotion: free to download

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Filipe Vaz, Nicolas Martin and Martin Fenker



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Filipe Vaz, Nicolas Martin and Martin Fenker